Title:
Surface Plasmon Interference Nanolithography
Author(s):
Zhao-Wei Liu,† Qi-Huo Wei,‡ and Xiang Zhang,†
Source:
Nano Letters 2005
Vol./Issue/Date:
Vol. 5
Year:
2005
Page(s):
957 - 961
Keywords:
Abstract:
A new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer
simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their
frequencies remain in the optical range. As a result, the resolution of this surface plasmon interference nanolithography (SPIN) can go far
beyond the free-space diffraction limit of the light. Simulation results show that one-dimensional and two-dimensional periodical structures
of 40-100 nm features can be patterned using interfering surface plasmons launched by 1D gratings. Detailed characteristics of SPIN such
as field distribution and contrast are also investigated.
Document:
Reference Id:
51
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